Congratulations to NDRL graduate student Xueqiang Zhang for being selected to present at the AVS 62nd International Symposium & Exhibition being held in San Jose, California. Xueqiang will be traveling this October to present Formation of Heterogeneous Multiple Oxide/Hydroxide Species in a GaP (111) Surface Tracked by In Situ Near-Ambient Pressure XPS, co-authored by Sylwia Ptasinska.